Kangwei Xu

LLM for EDA in Front-End Design: Challenges and Opportunities

Kangwei Xu, Bing Li, Ulf Schlichtmann

As chip complexity increases and time-to-market pressures grow, front-end design has become a critical bottleneck in chip development. Recently, Large Language Models (LLMs) have shown great potential in Electronic Design Automation (EDA). Beyond specification understanding, LLMs…Read more